WebDec 16, 2024 · Area-selective atomic layer deposition (ALD) of dielectrics on chemically similar growth and nongrowth surfaces is very challenging. In this study, we use aminosilane inhibitors to achieve selective blocking of ALD of Al 2 O 3 on plasma-deposited SiO 2 versus plasma-deposited SiN x . WebJun 22, 2024 · Area-selective atomic layer deposition (AS-ALD) is a promising technique for fine nanoscale patterning, which may overcome the drawbacks of conventional top-down approaches for the fabrication of ...
Research Area: Area Selective Atomic Layer Deposition
WebMar 19, 2024 · The ALD-inhibition pattern printing process was developed by using two techniques: overprinting for thickness control and multilayer printing, which are unique advantages of inkjet printing. Al 2 O 3 was chosen as a model metal oxide for selective ALD due to its enormous potential in various fields. WebJul 14, 2024 · Subsequently, area selective ALD of Pt was obtained at the unaffected sidewalls of the trench. Figure 3 Slide from Stacey Bent on topographically-selective ALD. 2. Rong Chen from Huazhong University of Science and Technology introduced a new concept that she referred to as facet-selective ALD. malesia 15 giorni
Application of three-dimensionally area-selective atomic layer ...
WebMar 15, 2024 · Selective atomic layer deposition To compare the performance of the polymers as ALD inhibitors, ZnO ALD was performed on SiO 2 , PMMA/SiO 2 and PTFEMA/SiO 2 . ZnO is a representative metal oxide which has high potentiality in applications, from memory devices [39] , [40] to emerging conceptual electronics [41] , … WebSelective atomic layer deposition (ALD) is a critical component of advanced manufacturing and offers an alternative to lithographic procedures. Traditional precursors such as AlCl 3 … WebFeb 26, 2024 · The selective ALD has unlocked attractive avenues for the development of novel nanostructures and found its versatile applications in emerging fields beyond … credential scans